国家/地区 美国（4） 世界知识产权组织（4） 加拿大（3） 中国（3） 日本（3） 澳大利亚（2） 欧洲专利局（EPO）（2） 韩国（2）
IPC部 A（4）
IPC大类 B01（4）
IPC小类 B01D（4）
IPC B32B009/00（4）
发明人 CHOI K（2） HEIGHT M（2） PARK H（2）
PARK H G（2）
公开年 2017（2） 2021（2）
申请年 2016（2） 
专利权人 HEIQ MATERIA.（2）

Face mask e.g. surgical face mask, comprises mask component to cover wearer's mouth and nose, and fastener engaging with mask component comprising air-permeable outer layer, inner layer located on inner side of mask component, and graphene layer, where fastener connects mask component to wearer.

ZHAMU A, JANG B Z, ZHANG B

Formation of porous graphene layer used as semipermeable membrane, involves providing catalytically active substrate comprising copper-nickel alloy substrate, to catalyze graphene formation under chemical vapor deposition conditions.

CHOI K, PARK H G, HEIGHT M, CHOI K J, PARK H, PIAO H

Manufacture of porous graphene layer used for e.g. textile industries, involves carrying out chemical vapor deposition of carbon source on catalytically active substrate which catalyzes graphene formation, and forming graphene.

PARK H G, HEIGHT M, CHOI K, PARK H

Membrane useful for e.g. water filtration, water desalination, immune-isolation, hemodialysis and hemofiltration, comprises first layer and second layer comprising porous graphene-based material, channel, and at least one spacer substance.

SWETT J L, SIMON S M, BEDWORTH P V