国家/地区 日本（3）
IPC部 B（3）
IPC大类 B01（3）
IPC小类 B01D（3）
IPC C01B031/04（3）
发明人
公开年
申请年 2015（2） 
专利权人

Method for manufacturing pellicle for lithographic apparatus involves removing first substrate portion to form freestanding membrane from graphene layer, in which freestanding membrane is supported by second substrate portion.

PETER M, ABEGG E A, GIESBERS A J, KLOOTWIJK J H, NASALEVICH M A, VAN DEN EINDEN W T, VAN DER ZANDE W J, VAN ZWOL P, VERMEULEN J P M, VLES D F, VOORTHUIJZEN W, GIESBERS A J M, VAN ZWOL P J, VOORTHUIJZEN W P, VAN DEN EINDEN W T A J, VERMEULEN J P M B

Particles used in solid-state composition for extracting nucleic acid, comprises graphene oxide and/or graphite oxide and cellulose.

SAITO NAGAHIRO, LI OI LUN HELENA, AKCEOGLU GARBIS ATAM

Use of reduced graphene oxide laminate membrane as barrier material in which reduced graphene oxide is formed from reduction of graphene oxide with reducing agent.

RAVEENDRANNAIR R, SU Y, GEIM A, RAVEENDRAN N R