国家/地区 中国（7）
IPC部 C（7）
IPC大类 C01（7） H01（2）
IPC小类 C01B（7）
IPC C01B032/184（3） C01B032/194（2） C01B032/198（2）
发明人 WANG C（7）
公开年 2020（7）
申请年 2019（7）
专利权人 HARBIN INST .（2）

Adjustable frame for extracting graphene material, comprises first bracket, lantern ring, second lifting rod sliding groove, third lifting rod, connecting rod, second chute and first rotating shaft and one side of first bracket is provided with first lifting rod.

LIANG S, WANG C, MA D, JING C, ZHANG J, LIU Z, LI Y

Graphene puffing device comprises conveying assembly and heater, where heater is provided with heating cavity and conveying assembly comprises loading material zone, heating zone and discharging zone which are connected in turn.

XIAO S, WANG C, WANG Y, ZHAO C, GAO L, ZHU S, ZHANG X, HOU D

Preparing graphene material for preparing of anode materials for lithium ion batteries, involves graphene oxide precursor, combining plasma oxidation and chemical oxidation to oxidize graphite powder to prepare graphene oxide precursor.

FANG S, GE W, ZHOU Y, WANG X, LI F, CONG J, WANG C, XIANG K, WU J, JIN P

Graphene oxide paper with surface microsphere structure involves distributing graphene oxide evenly with micron-level graphene oxide balls on surface, connecting tightly by graphene sheet, and having graphene oxide balls.

TAN H, ZHAO Y, WANG C, SUI C, WU F

Preparing dendrimers reinforced perforated graphene oxide paper involves forming graphene oxide dispersion by improved Hummers method, and adding hydrogen peroxide solution to etch graphene oxide dispersion.

WANG C, ZHAO Y, HE X, TAN H, SUI C, WU F

Graphene material with regularly arranged hole structure is obtained by compositing graphene material on template material and using chemical etching or laser process.

WANG C, CHEN X, SHAO J, CHEN F

Preparing graphene material comprises mixing chitosan, activator, acetic acid and solvent, stirring, adding cross-linking agent, cross-linking reaction, drying the paste precursor, activating in alkaline solution, and carbonizing.

WANG C, XIAO X, ZHONG G, XU K, WU S, SU W, ZHAO W, LV W