国家/地区 美国（5） 中国（2） 世界知识产权组织（2）
IPC部 B（5）
IPC大类 B32（5）
IPC小类 B32B（5）
IPC C01B031/04（5）
发明人
公开年 2014（2） 2015（2）
申请年 2013（5）
专利权人

Etching method of graphene, involves etching exposed portions of graphene to form etched graphene structure, after applying resist to surface of graphene opposite to patterned substrate.

ANDERSON K, SJONG A

Transferring a graphene layer from a metal substrate to a second substrate by providing a graphene layer on the metal substrate, adsorbing hydrogen atoms on the metal substrate, and treating the metal substrate.

HUYGHEBAERT C, VEREECKEN P M, POURTOIS G

Graphene for electronic equipment e.g. display device, battery, photoelectric device and solar cell, contains nitrogen-containing organic compound.

NA D H, PARK E S, RYU J C, WON D K, CHEOL R J, NA D, WON D, PARK E, RYU J, YUAN D, YOO J H, LIM Y M, HUH Y

Fabricating graphene platelet, comprises providing highly-graphitized graphene, and providing shear force acting on graphitized graphene to separate highly-graphitized graphene into graphene platelets having single or multi-layer structure.

LIN I, LIN H, LIN Y, SONG J, SUNG C, LIN I C, SUNG C M, LIN H C

Graphene useful in a device including a sensor and FET, comprises an etched edge portion, where the etched edge portion comprises a functional group e.g. ketone, aldehyde and carboxylic acid.

CHOI W M, HONG B H, CHOI J