国家/地区 美国（2）
IPC部 C（4）
IPC大类 C01（4）
IPC小类 C01B（4）
IPC C01B031/04（4）
发明人
公开年 2016（4）
申请年 2015（2） 
专利权人

Preparing uniform graphene thin film by introducing metal substrate into chemical vapor deposition reaction chamber, heating chamber, annealing metal substrate and carrying out graphene nucleation on metal substrate surface.

GAO X, JIANG H, LI Z, SHI H, YANG G

PROCESS FOR PREPARING GRAPHENE-BASED MATERIALS (GRAPHENE OXIDE AND REDUCED GRAPHENE OXIDE) ON VERY LARGE SURFACES BY CHEMICAL EXFOLIATION.

COTET L C, DANCIU V, BAIA G L

Production method for obtainment of three-dimensional closed graphene-based nano/microstructures involves flowing second fluid through second flow path and exiting through second fluid exit such that second fluid covers first fluid.

MENCELOGLU Y Z, OKAN B S, YILDIZ M, SANER OKAN B

Method for producing large-area reduced graphene oxide sheet on substrate, involves subjecting substrate and graphene oxide layer to reduction process simultaneously, and forming reduced graphene oxide layer after reduction process.

HU C L, HU C