国家/地区 |
世界知识产权组织(16)![]() |
IPC部 |
C(16)![]() |
IPC大类 |
C01(16)![]() |
IPC小类 |
C01B(16)![]() |
IPC |
D01F009/12(16)![]() |
发明人 |
SHIN M K(4)
KIM J(3)
CHO K R(2)
CHO Y J(2) GAO C(2) HYEONG K S(2) JEONG K S(2) KIM H J(2) KIM J H(2) KIM S H(2) KIM S J(2) KYOON S M(2) PARK S Y(2) YEO C S(2) |
公开年 | 2021(4) 2017(3) 2012(2) |
申请年 | 2020(3) 2012(2) 2017(2) |
专利权人 |
AICT(2)
PURITECH CO .(2)
UNIV HANYANG.(2)
UNIV ZHEJIAN.(2)
|
KOO B C, KIMSEOGYUN, HWAN K J, LEE D, DONG K, HWANG J Y, KIM D Y, KIM J W, KU B, KIM S G, KIM J, KIM N D, KIM D
JOMPHOAK A, JARUWONGRUNGSEE K, NUNTAWONG N, POGFAY T, WAIWIJIT U, MATUROS DANIELS T, JARIYAKUN K, PONGSAKSAWAD W, KHAMSUK P
TRAN T S, ROY CHOUDHURY N, DUTTA N, ROY C N, AWARD T, ROICHOUDURINAMITA, DUTANABA, DUTA N
HAN J T, KIM J H, CHO J Y, LEE G W, PARK J H, SEO S H, JEONG S Y, JEONG H J, HAN J, KIM J, LEE G, CHO J, JEONG S, SEO S, JUNG S Y, CHUNG H J
OH E G, KIM J E, LEE M J, LEE J H, KIM J H, KWON W J, LEE W J, LEE J K, OH E, KIM J, LEE M, LEE J, KWON W, LEE W
PARK S Y, SHIN M K, KIM H J, YEO C S, CHO Y J, CHO K R
PARK S Y, SHIN M K, KIM H J, YEO C S, CHO Y J, CHO K R