国家/地区 世界知识产权组织（2）
IPC部 B（3）
IPC大类 H01（3） B82（2） C23（2）
IPC小类 H01J（3）
IPC H01J037/32（2）
发明人
公开年 2023（3）
申请年 2022（3）
专利权人

Depositing graphene or graphene oxide onto substrate from gaseous source of carbon precursor involves using plasma-enhanced chemical vapor deposition method, where carbon precursor consists of ethylene and the process is carried out in absence of carrier gas.

JOUIAD M, EL MARSSI M, LEJEUNE M

Chuck assembly used in semiconductor device fabrication system, comprises chuck base includes lower base and upper base that is on lower base, ceramic plate on upper base, and isolator ring enclosing outer sidewall of lower base.

JUNG U, SHIN M, SUNG D, NA D, KIM D, KIM K, JEONG S, JUNG S H, KIMKYUNGSUN, KIM D W, SUNG D Y, SU S M, JUNGUNGYO

Particle penetration determining device for use in quantum computer, has layer arranged between particle source and material, where layer changes its resistance when particle penetrates, and determining unit determining change in resistance.

ESQUINAZI P D, MEIJER J B, KUEPPER J