国家/地区 台湾（3）
IPC部 C（3）
IPC大类 C09（3）
IPC小类 C09D（2） G03F（2） H01L（2）
IPC H01L021/02（2） H01L021/027（2）
发明人
公开年 2021（3）
申请年 2020（3） 
专利权人

Composition used in forming thin film, comprises chemical contrast pattern having first region of first chemistry on background of second chemistry, and microphase-separated block copolymer material overlying the chemical contrast pattern.

ARNOLD M, JACOBBERGER R, NEALEY P, XIONG S, CHANG T, MA Z, NEALEY P F

Composition used for fabricating semiconductor structure on semiconductor device for removing metal-containing layer of pellicle structure, comprises water, oxidizing agent(s), and acid(s).

CHEN C, CHANG C, LEE Y, LIU W D, WINDOW C, LEE W, LU W, LIU W, LI Y, ZHANG Z, CHEN Z

Graded-index device e.g. lens, comprises phase comprising at least one polymer, phase comprising at least one component comprising functional component, and/or functional precursor component and optionally interface.

DEORE B, PAQUET C, LACELLE T, MALENFANT P R L, AMAYA R, HYLAND J