国家/地区 中国（6）
IPC部 C（6）
IPC大类 C09（6）
IPC小类 C09D（6）
IPC C09D007/61（6） C09D007/65（2） C09D133/00（2）
C09D163/00（2） C09D175/04（2）
发明人 CHEN H（6）
公开年 2023（6）
申请年 2022（6） 
专利权人

Preparing high abrasion resistance chemical mechanical polishing pad used for production of semiconductor chips, by mechanically dispersing filler and surfactant in organic solvent to obtain dispersion, adding resin solution to dispersion, stirring and coating on transparent film coiled material.

YAO L, CHEN H, XIANG H

Weather-resistant powder coating used for metal surface treatment, comprises modified resin, oxide, triglycidyl isocyanurate, binder, leveling agent, barium sulfate, silica powder, stabilizer, and filler, where modified resin is obtained by mixing epoxy resin and carboxyl-terminated polyester resin.

CHEN H, SHI Y, SUN D, HU Q

Graphene auxiliary agent useful in main resin for preparing electrophoretic coating emulsion, comprises e.g. graphene oxide powder, dimethylformamide solvent, methacrylic acid monomer, polymerization inhibitor (hydroquinone), and first catalyst (triphenylphosphine).

HU H, GUO H, LIU W, QU J, CHEN H, ZHOU X

Preparing transparent oil painting pigment comprises e.g. mixing natural vegetable oil, aggregate oil, reacting it with toner, environmentally friendly dispersant, graphene/polyaniline composite material and filler, filling and packaging.

CHEN H, CHEN F

Electro-thermal coating material comprise agglomerant used in metal substrate, wood substrate, glass substrate or ceramic substrate coating, comprises agglomerant, nano graphene sized bamboo carbon fibre, heat-resistant filling material, phase change microcapsule and polyacrylamide.

GUAN G, XIE R, TIAN L, CHEN Y, GAO T, CHEN H, TAO X, ZHAO L, ZHONG Q, YANG D, XIE S, LI Y, WU P

Heating slurry with antibacterial radiating function comprises graphene, graphite alkyne, boron nanosheets, boron nitride nanosheets, aqueous-based resin, wetting agent, dispersant, anti-settling agent, co-solvent, film-forming agent, defoamer, curing agent and deionized water.

TIAN R, CHEN X, CHEN H, DI P, JIANG X