国家/地区 美国（4）
IPC部 C（4）
IPC大类 C01（4） C12（2） G01（2）
IPC小类 C01B（4）
IPC G01N027/414（2）
发明人
公开年 2023（4）
申请年 2022（4）
专利权人

Pellicle for use in lithography mask assembly for extreme ultraviolet lithography process in semiconductor manufacturing industry to optically transfer patterns onto a substrate, comprises membrane that includes silicon carbide nanostructures with silicon carbide nanotubes.

ONEILL J, HART A H C

Precision graphene nanoribbon bridge molecule in graphene nanoribbon molecular electronics nano-circuit, comprises central GNR having precision structure, functional anchoring group, central functional conjugation group at specified location and edge group functionalization with solubilizing groups.

MCCURDY R, FISCHER F

Method for classifying images for forming oligolayer flakes of substrate, involves forming micrograph of surface, and classifying micrograph into one of set of categories, where set of categories includes category comprising micrographs.

JIANG Z, SIU M, FONG K C

Biosensor used treating and monitoring treatment of at least one diseases and conditions associated with viral infection comprises substrate and binding site including antibody configured to bind SARS-CoV-2 spike glycoprotein.

LINDEMANN G W