国家/地区 世界知识产权组织(147)
IPC部 C(106) B(98) H(78)
G(22) A(5) F(4)
D(3)
IPC大类 C01(93) H01(75) B82(70)
B01(29) C08(21) B32(18)
C23(15) G01(14) B05(11)
C09(11) C07(8) C25(8)
H05(6) A61(5) C02(5)
IPC小类 C01B(93) B82Y(66) H01L(45)
B01J(21) H01B(19) B32B(18)
B82B(16) C08K(14) C23C(14)
H01M(13) B05D(11) C08L(10)
G01N(8) B01D(7) C07C(6)
IPC C01B031/04(66) C01B031/02(61) B82Y030/00(48)
B82Y040/00(40) B82B003/00(16) H01L029/16(15)
C08K003/04(13) C23C016/26(12) B32B009/00(11)
B82Y099/00(11) H01B001/04(10) B82Y010/00(9)
C01B031/00(9) H01L029/06(9) H01L029/66(9)
发明人 MILLER S A(6) FENG X(4) KIM H(4)
MUELLEN K(4) MULLEN K(4) FISHER T S(3)
HONG S(3) KELBER J(3) NOMOTO K(3)
REDMOND K(3) SCHEFFER D(3) SCHVAB M G(3)
SCHWAB M G(3) SCHWAB M G S(3) WANG Y(3)
公开年 2013(147)
申请年 2012(147)
专利权人 EMPIRE TECHN.(7) KOREA ADVANC.(5) BASF AG(4) BASF SE(4)
GRAPHENE PLA.(4) ISLAND GIANT.(4) KOREA ADV IN.(4) SAMSUNG TECH.(4)
SEMICONDUCTO.(4) VORBECK MATE.(4) VORBECK MATE.(4) BASF CHINA C.(3)
FISHER T S(3) HANWHA AEROS.(3) HANWHA TECHW.(3) INST MICROEL.(3)
INT BUSINESS.(3) KELBER J(3) MAX PLANCK G.(3) NOKIA CORP(3)

BONILLA G, DIMITRAKOPOULOS C D, GRILL A, HANNON J B, LIN Q, NEUMAYER D A, OIDA S, OTT J A, PFEIFFER D, DIMITRAKOPOULOS C, HANNON J, NEUMAYER D, OTT J, DIMITRAKO P C D, GREER A