国家/地区 韩国（7） 美国（2） 世界知识产权组织（2）
IPC部 C（7） B（3） G（2）
IPC大类 C09（7）
IPC小类 C01B（4） C09K（4） B82Y（2）
C09D（2）
IPC B82Y020/00（2） B82Y040/00（2） C09K011/65（2）
发明人 CHO S O（2） KANG S（2） LEENAEUN（2）
公开年 2022（7）
申请年 2021（6） 
专利权人 KOREA ADVANCED SCI TECHNOLOGY INST（7）

Structure useful for producing high-purity methane, comprises conductive carbon nanotube structure, and iron oxide bonded to surface of carbon nanotube structure.

KANG S, SEUNGYOUBHAN, KANG J W, YANG S M

Light-emitting device for e.g. displays, includes carbon-containing film comprising at least one carbon atom, and light-emitting alkylene group, where light-emitting group is chemically bonded to at least one carbon atom on surface of carbon-containing film.

HWANG K, CHOI H, KIM J, KWAK S, JEONG J, BAEK S, KIM S, BAIK M, JUNG Y, SIK C Y, BAEK M H, JUNG J H, KIM J H, CHOI H H, HWANG K Y

Production of graphene quantum dots used in electronic device, involves thermally decomposing silicon carbide substrate in reduced pressure atmosphere in which mixed gas containing hydrogen is supplied.

CHO S O, LEENAEUN

Manufacturing biocompatible graphene quantum dots useful in bio-electronic device for bio-imaging and bio-sensing comprises preparing hydrogen-terminated graphene quantum dot and hydrophilizing hydrogen-terminated graphene quantum dots.

CHO S O, LEENAEUN

Ground reinforcement material used for reinforcing ground, comprises gas hydrate-soil mixture.

CHO G C, KANG S J, KANG C W, KANG S, HWAN K C

Adhesive composition for reticle assembly, comprises a polyphenol compound including tannic acid, a polymer including polyvinyl alcohol and a solvent including water and alcohol.

LEE Y, JEONG C Y, LEE H, YOO B, KIM M J, KIM M, RYU B C, LEE H S, YOUNG J C, DING C, LI H, LIU B

Ink composition for security printing, and used in manufacture of security indicia, comprises dielectric matrix having hydroxyl group, graphene quantum dots dispersed in dielectric matrix, and graphene quantum dot composite having afterglow properties emitting phosphorescence at room temperature.

JEON S, PARK M, WOO J, PARK M S