国家/地区 韩国（4） 美国（2）
IPC部 G（4） B（2） C（2）
IPC大类 G03（4） B01（2） C01（2）
IPC小类 G03F（4） B01J（2） C01B（2）
IPC G03F001/22（4） G03F001/62（4） C01B032/184（2）
发明人 JEONJUNHYUCK（4）
公开年 2022（3）
申请年 2021（2） 
专利权人 KOREA ELECTRONICS TECHNOLOGY INST（4）

Pellicle for extreme ultraviolet exposure, has pellicle layer that is provided with yttrium compound-containing layer containing ytterbium-based compound.

KIMHYUNGKEUN, KIM S K, MI K H, LIM H M, KIM H Y, JEONJUNHYUCK, LEE S M

Direct growth method of multilayer graphene through pressure heat treatment, comprises forming etch stop layer, forming metal catalyst layer, forming amorphous carbon layer and directly growing multilayer graphene on seed layer.

KIM H, KIM S K, MI K H, YOO C S, JOJINWOO, KIM H Y, JEONJUNHYUCK, YUNSUNGHO, SUNG K H, LEE S M

Pellicle i.e. consumable component for protecting mask from contaminants in lithography process for semiconductor or display manufacturing, has substrate whose central portion is formed with opening, and pellicle layer containing amorphous carbon and core layer, formed on support layer.

KIM H Y, CHO J W, KIM H M, KIM S G, KIM H K, KIM H, MI K H, KIM S K, JEONJUNHYUCK, LEE S M

Preparing pellicle for extreme UV exposure with graphene defect healing layer, involves forming support layer of silicon nitride material on silicon substrate, and forming core layer of graphene material on support layer.

KIMHYUNGKEUN, MI K H, LEE W S, YANG H S, JOJINWOO, KIM B, JEONJUNHYUCK, LEE G H, KIM H Y, JEON J H, KIM S G, CHO J W, KIM H M, KIM H K