国家/地区 韩国（4）
IPC部 G（4）
IPC大类 G01（4）
IPC小类 G01N（4）
IPC G01N023/20（3） G01N023/00（2） G01N023/207（2）
发明人 SEUNG H H（4）
公开年 2015（4）
申请年 2014（4）
专利权人 KOREA INST CERAMIC ENG TECHNOLOGY（4）

X-ray analysis equipment for analyzing pole microscopic thickness, has detecting apparatus which detects X-ray irradiated from graphene sample that is penetrated inside of chamber.

SEUNG H H

X-ray analysis apparatus, has X-ray irradiation equipment irradiating X ray inside of chamber with graphene sample, and sample holder catching edge portion inside chamber, where graphene sample is laid in X-ray exposure angle.

SEUNG H H

X-ray analysis method for extreme super-thin graphene, involves irradiating X-ray in inside of chamber in which graphene sample is placed, and applying magnetism/electricity in inside of chamber by electromagnetic confirmation device.

SEUNG H H

Graphene reference resolution method involves preparing standard graphene to draw effective information about graphene thickness including full width at half maximum and inter-layer space from diffraction peak of graphene crystal plane.

SEUNG H H, HUR S H