国家/地区 中国（3）
IPC部 H（3）
IPC大类 H01（3）
IPC小类 H01L（3）
IPC H01L043/06（2） H01L043/14（2）
发明人 XIE H（4）
公开年 2016（4）
申请年 2015（2）  2016（2） 
专利权人 SHANGHAI INST MICROSYSTEM INFORMATION（4）

Quantum interference device structure for use in sensors and other devices, comprises first superconductor layer and first dielectric layer, graphene layer, second dielectric layer, metal layer and second superconducting layers.

WANG H, XIE H, LI L, YANG P, XIE X, JIANG M

Method for preparing quantum hall device, involves forming superconducting thin film layer on substrate, covering with dielectric thin film layer, and forming graphene layer, followed by forming metal electrode.

WANG H, XIE H, WANG X, XIE X, JIANG M

Method of growing graphene used in e.g. electronic devices, involves heating insulated substrate placed in growing cavity, introducing gas containing catalytic elements into cavity, and pumping carbon source to cavity to grow film.

WANG H, TANG S, LU G, WU T, JIANG D, DING G, ZHANG X, XIE H, XIE X, JIANG M

Preparation of magnetic field sensor used in semiconductor field, involves forming polypropylene carbonate-hexagonal boron nitride structure on substrate, placing polydimethylsiloxane film, adsorbing graphene film, and etching.

JIANG M, LI L, XIE X, XIE H, WANG H