国家/地区 中国（4）
IPC部 C（2）
IPC大类 C01（2）
IPC小类 C01B（2）
IPC C01B031/04（2）
发明人 HAN B（4）
公开年 2012（4）
申请年 2010（3） 
专利权人 NAT CENT NANOSCIENCE TECHNOLOGY CHINA（4）

Method for forming graphene oxide pattern and graphene pattern, involves enabling contact between graphene oxide solution and patterning polydimethoxy silane stamp and drying, followed by enabling contact between dried stamp.

CHENG Q, HAN B, SUN S, WANG T, WU C, ZHOU D

Hydrogel system useful for sustained-release of drug, comprises block copolymer modified graphene and/or graphene oxide, drug molecule and cyclodextrin hydrogel.

CHENG Q, HAN B

Forming graphene oxide pattern, comprises e.g. preparing substrate, forming self-assembling monomolecular film on substrate, covering film using mask to expose, and removing mask to obtain self-assembling monomolecular film template.

CHENG Q, HAN B, SUN S, WU C

Forming graphene oxide pattern, comprises e.g. preparing substrate, preparing hydrophobic self-assembly monomolecular film on surface of substrate, and exposing the film by mask to ultraviolet lamp, and removing mask after exposure.

CHENG Q, ZHOU D, WU C, SUN S, HAN B