国家/地区 美国（4） 韩国（3） 中国（2） 欧洲专利局（EPO）（2）
IPC部 H（4）
IPC大类 H01（4）
IPC小类 H01L（4）
IPC H01L021/02（3） H01L021/033（2） H01L023/532（2）
发明人 SHIN H（4）
公开年 2017（4）
申请年 2016（3） 
专利权人 SAMSUNG ELEC.（4）

Photomask pellicle for protecting photomask in exposure process using light including extreme UV (EUV), has nanocrystalline graphene that comprises nanocrystalline crystal grains and grains comprise two dimensional carbon structure.

SHIN H J, SONG H J, PARK S J, SHIN K W, LEE C S, SHIN H, SONG H, PARK S, SHIN K, LEE C

Hybrid interconnect structure for use in electronic device, has interfacial bonding layer formed between non-metallic material layer and graphene layer or metal and graphene layers, where bonding layer is formed with metallic material.

SHIN K, SHIN H, KIM C, LEE C, PARK S, SONG H

Multilayer structure for electronic device has diffusion barrier layer between first material layer and second material layer, that includes non-graphene-based two-dimensional (2D) material.

SONG H, NAM S, PARK S, SHIN K, SHIN H, LEE J, LEE C, CHO Y, SONG H J, NAM S G, PARK S J, SHIN K W, SHIN H J, LEE J H, LEE C S, CHO Y C, NA S, ZHAO L

Two-dimensional material hard mask for manufacturing electronic device e.g. capacitor, has hydrogen, oxygen and two-dimensional material layer with layered crystalline structure, and carbon structure includes graphene sheets.

SHIN K, SEOL M, SHIN H, KIM S, PARK S, SHIN K W, SEOL M S, SHIN H J, KIM S W, PARK S J