国家/地区 韩国（5） 世界知识产权组织（2）
IPC部 C（4） G（2）
IPC大类 C01（3） C23（2）
IPC小类 C01B（3） C23C（2）
IPC C01B032/184（2） C01B032/194（2） C23C014/04（2）
发明人 WOOK Y B（5）
公开年 2022（5）
申请年 2021（2）  2022（2） 
专利权人 GRAPHENELAB .（4）

Manufacturing method of graphene-coated mold, involves forming mold by forming pattern on laminated dry film photoresist (DFR) or DFR/TRF film through exposure and development.

MOON S I, KWON Y, WOOK Y B

Manufacturing graphene thin film for pellicle material using ozone gas useful in semiconductor devices comprises forming graphene on the upper surface of substrate, exposing graphene layer to ozone, and heat-treating and etching.

LEE G H, KWON Y, WOOK Y B, MOON S I, MOON J, KIM K S, LEE S M

Manufacture of shadow mask, involves forming buffer layer, depositing metal layer, forming amorphous carbon layer and crystalline carbon layer, removing amorphous carbon layer and metal layer, and separating buffer layer and crystalline carbon layer.

MOON S I, KWON Y, WOOK Y B, MOON J, KIM K S, LEE S M

Chlorine-ion measurement sensor for detecting chlorine ions in reinforced concrete, has silver/silver chloride electrode which is immersed in electrolyte, and working electrode that is composed of silver component coated with silver chloride and coated with graphene oxide.

KIM S I, YOO B U, LEE J Y, PARK G R, KIMSEYL, WOOK Y B, LEE J, PARK K

Etchant composition to manufacture graphene with low sheet resistance, comprises sulfuric acid, hydrogen peroxide, purified water, N-heterocyclic aromatic compound e.g. benzotriazole, and aromatic boric acid e.g. phenyl boric acid.

MOON J, KWON Y, WOOK Y B, LEE S M, MOON S I, KIM K S, LEE G H, HYUN D, SIMSUJIN, SHIM S J, HYUN D S, YOO B W, KWON Y D, MOON J T