国家/地区 中国（4） 印度（3） 澳大利亚（2） 欧洲专利局（EPO）（2） 俄罗斯（2） 美国（2） 世界知识产权组织（2）
IPC部 C（8）
IPC大类 C01（8）
IPC小类 C01B（8） C08L（8） C08K（4）
B82Y（3） C04B（2） C10C（2）
IPC C08L095/00（8）
发明人 GERSHEVICH M I（2） SHVARTSMAN D I（2）
公开年 2021（4） 2022（2）
申请年 2021（3） 
专利权人 GERSHEVICH M.（2） SHVARTSMAN D.（2）

Modifying additive is characterized by the fact that carbon nanomaterials are distributed in the matrix of Grade A oil extract and include single-walled carbon nanotubes.

SHVARTSMAN D I, NAPARTOVICH M A, GERSHEVICH M I

Granulated modifier for asphalt concrete has field of construction production in the road industry and can be used in the manufacture of asphalt concrete.

SHVARTSMAN D I, GERSHEVICH M I

Preparation of graphene oxide used for road rubber composite modified asphalt by removing moisture of equipment, spreading expanded graphite, potassium permanganate and sulfuric acid, reacting, adding hydrogen peroxide, and precipitating.

FENG X

Processing coal, comprises e.g. subjecting raw coal to liquefaction process effective to form pitch resin, and subjecting the pitch resin to variable crystallinity spinning process effective to form raw fiber.

TARGETT M, YURCHICK C L

Preparing crystalline graphene useful as modifying agent in preparation of modified asphalt, comprises heating high-activity calcium hydroxide powder, performing chemical vapor deposition reaction, acid washing, filtering and etching.

CUI Y

Synthesizing reduced graphene oxide from coal tar pitch involves heating the coal tar pitch in presence of air followed by cooling down allowing minimal interaction of the coal tar pitch with the air.

CHOUDHARY S K, DAS S, KULKARNI G U R, PUJAR R N

Modifying graphene oxide microsphere under various external force fields comprises adding graphene to concentrated sulfuric acid, ultrasonicating, adding potassium permanganate , then diluting deionized water.

LI J, YIN Y, HAN M, ZAHNG F L

Synthesis of graphene derivatives and functional materials used in e.g. transistors, sensors, actuators, pharmaceutical, information displays and semiconductor comprises forming refluxed solution of starting material and additive.

TANIMOLA O W