国家/地区 中国（6）
IPC部 C（6）
IPC大类 C23（6）
IPC小类 C23C（6）
IPC C23C016/458（6）
发明人
公开年 2022（5）
申请年 2022（6）
专利权人

Processing central supporting rod useful for vapor deposition coating device by making ceramic material in rod body, installing supporting cap, mixing polyvinyl alcohol, water in glue, solidifying isolation in contact layer, applying glue on supporting cap, inserting locating rod in locating hole.

LIU W

Growing large size graphene crystal domain at low temperature by plasma enhanced chemical vapor deposition method, comprises putting high-purity copper foil in faraday cage, and placing cage in plasma-enhanced chemical vapor deposition reaction chamber.

ZHEN Z, ZHANG R, XU Z, HE L, LI N

Preparing graphene film, comprises moving growth substrate in reaction chamber at predetermined speed under action of conveying mechanism along with supporting structure until reaction chamber is conveyed out.

GUO B, QU Y, TAN H, SHEN D, WANG W

Copper foil coating device useful in technical field of electric material, has rotating pipe whose top end extends to inside of methane concentration detecting box, where bottom end of rotating pipe extends to inside of blower.

Bracket for preparing graphene by chemical vapor deposition method, has locating plate and supporting rod, where locating plate is set with two blocks in parallel, and space for placing growing substrate is formed between two locating plates.

HUANG W, CHEN Q, CAI J, HAO Z

Heating furnace for use in chemical vapor deposition reaction device, has graphite plate supporting wafer substrate, where one side surface used for substrate is provided with growth graphene.

XUE Z, CHEN Z, SHAN J, WANG M, SUN J, LIU Z