国家/地区 美国（4）
IPC部 C（4） B（3）
IPC大类 C25（4） C01（3） B32（2）
IPC小类 C25F（4） C01B（3） B32B（2）
IPC C25F003/02（4）
发明人 LI X（3） GUO L（2） HAN S（2）
公开年 2014（4）
申请年 2012（2） 
专利权人 INT BUSINESS.（2）

Etching graphene nanostructure, involves providing piece of highly oriented pyrolytic graphite, depositing DNA sample on graphite, placing in humidity controlled chamber, applying relative humidity, and applying electrical voltage.

DARLING M J

Modified bubbling transfer method for graphene delamination involves dipping lift up third stack, graphene film, and transfer cloth into de-ionized water to remove electrolyte residue, and drying third stack to remove de-ionized water.

LI X, STEHLE Y Y

Electrochemical etching method for removing metal substrate layer from graphene layer, involves connecting graphene layer or metal substrate layer to power source to supply current to etch metal substrate layer from graphene layer.

HAN S, GUO L, LI X

Apparatus for electrochemical or electroplating etching of copper foils from graphene for e.g. electronic device application, has anode including metal substrate layer etched from graphene layer in response to current flowing through anode.

HAN S, GUO L, LI X