国家/地区 世界知识产权组织（4）
IPC部 C（4）
IPC大类 C30（4） C01（3） C23（2）
H01（2）
IPC小类 C30B（4）
IPC C30B029/02（4）
发明人
公开年 2017（4）
申请年 2016（3） 
专利权人

Formation of multilayer structure, involves epitaxially depositing graphene layer on layer comprising cobalt that is in contact with dielectric layer and has semiconductor wafer with front wafer surface contacting dielectric layer.

BERRY V, BEHURA S, NGUYEN P, SEACRIST M R

Manufacturing method of semiconductor device, by forming graphene layer on first substrate, transferring graphene layer from first substrate to second substrate, and forming single-crystalline film on graphene layer.

KIM J

Production of graphene used in e.g. semiconductor surfaces by depositing carbon on substrate, involves providing substrate of wafer having crystalline layer of germanium with crystallographic orientation in reactor, and evoking gas flow.

PASTERNAK I, STRUPINSKI W

Composite material used for manufacturing graphene film, consists of single-crystal sapphire substrate having off-angle degree of specified value, metal film and graphene film, in order.

AOTA NATSUKO, AIDA HIDEO, TACHIBANA MASARU, MORISAKO SHIYO, AOTA N, AIDA H, TACHIBANA M, MORISAKO S