国家/地区 中国（10）
IPC部 C（10）
IPC大类 C01（10）
IPC小类 C01B（10）
IPC C01B032/194（5） C01B032/186（4）
发明人 LIN L（10）
公开年 2018（3） 2022（3）
申请年 2021（4）  2017（3） 
专利权人 UNIV PEKING（10）

Transferring method of film graphene, involves attaching side of graphene film/silicon resin layer/organic adhesive layer/graphene film composite to target substrate, and removing organic adhesive layer with organic solvent, removing metal substrate to obtain polymer film/silicon resin /glue layer.

LIN L, DING Q, ZHONG H, LIU Z

Method for transferring single crystal wafer graphene film to target substrate e.g. silicon sheet, involves removing heat release adhesive tape and each adhesive layer in composite layer after drying obtained heat release tape/auxiliary support layer/terpenoid small molecular layer.

LIU Z, XIE Q, CAI A, YAN R, WANG M, GAO X, LIN L, ZHENG L, HU Z, PENG H

Graphene film used in flexible film electronic and optoelectronic device such as touch screen, solar battery, organic LED and sensor, has specific wrinkle density.

XIE Q, LIN L, MA J, SONG Y, DING Q, ZHANG Y, LIU Z

Transferring graphene film, involves attaching side of graphene release adhesive tape layer/organic auxiliary support layer/small molecule polymer layer/graphene heating, and organic solvent organic support layer and polymer.

LIN L, DING Q, ZHANG Y, SONG Y, MA J, LIU Z

Transferring graphene film comprises e.g. providing first graphene composite structure, removing base layer of first graphene composite structure to obtain second graphene composite structure, and removing buffer layer.

PENG H, GAO X, ZHENG L, LIN L, LIU Z, HU Z, YAN R, YANG H

Cleaning method of graphene comprises rolling the surface of graphene through curved body provided with adsorbent on curved surface.

LIU Z, PENG H, SUN L, LI Y, LIU X, LIN L, ZHANG J, JIA K

Preparation of ultra-clean graphene involves using chemical vapor deposition, and providing foam copper above growth substrate.

LIU Z, PENG H, LIN L, ZHANG J, SUN L

Preparing graphene involves putting foam copper in copper substrate, introducing carbon source gas and hydrogen to perform chemical vapor deposition, and depositing surface that contacts copper substrate with foam copper.

LIU Z, PENG H, LIN L, ZHANG J

Preparing ultra-clean graphene used in optical and electric field, involves adding copper substrate in tubular furnace, introducing carbon source gas and hydrogen for chemical vapor deposition and introducing carbon dioxide.

LIU Z, PENG H, ZHANG J, GU K, LIN L, SUN L

Preparation of ultraclean graphene comprises considering gas path from upstream to downstream direction, placing copper acetate and copper substrates at intervals and introducing hydrogen for chemical vapor deposition.

LIU Z, PENG H, GU K, ZHANG J, LIN L, SUN L