国家/地区 美国（7）
IPC部 C（7）
IPC大类 C01（7） B32（2） B82（2）
H01（2）
IPC小类 C01B（7）
IPC C01B031/04（4） B82Y040/00（2）
发明人 LIN H（7）
公开年 2013（3） 2022（2）
申请年 2012（2）  2013（2）  2021（2） 
专利权人 LAIZUAN CO L.（2） LIN H（2） QUE Y（2） RITEDIA CORP（2）
UNIV NAT TSI.（2）

Semiconductor device, comprises substrate and fin structure on substrate, and includes epitaxial region, etch stop layer on epitaxial region, interlayer dielectric layer on etch stop layer, and metal contact through etch stop layer and interlayer dielectric layer.

SHEN T, HUANG J, CHEN S, LIN H, LIN C, WOON W, KHADERBAD M A

Nanogel for preventing or treating disease or condition susceptible to amelioration by anticoagulant or antioxidant for e.g. thrombophilia, vascular thrombosis, comprises graphene-like nanosheet and polysaccharide.

LIN H, HUANG C, MAO J, WANG C, HUANG Z

Process for preparing porous graphene-based film, involves separating reduced graphene oxide sheet having pore of different size is separated from sheet overlapping by different interlayer distance.

LIN H, JIA B

Fabricating graphene platelet, comprises providing highly-graphitized graphene, and providing shear force acting on graphitized graphene to separate highly-graphitized graphene into graphene platelets having single or multi-layer structure.

LIN I, LIN H, LIN Y, SONG J, SUNG C, LIN I C, SUNG C M, LIN H C

Making graphene layer used as transparent electrode layer in optoelectronic devices, comprises e.g. forming metal layer on first side of substrate, forming carbon source layer on metal layer and irradiating second side of substrate by laser.

CHUEH Y, DING J, LIN H, HUANG Y, QUE Y

Producing graphene, comprises optionally forming a metal layer on a substrate, providing carbon source to form carbon-containing layer, and performing a treatment by low-frequency electromagnetic wave using microwave generator.

CHUEH Y, YEN W, LIN H, QUE Y, YAN W, CHUEH Y L, YEN W C, LIN H C

Fabricating patterned graphene, comprises forming catalytic layer on substrate and carbon layer of e.g. iron on catalytic layer, photolithographically etching on carbon layer and heating obtained layer to form patterned graphene layer.

SUNG C, LIN I, LIN H, LIN Y, SONG J