国家/地区 中国（6）
IPC部 C（6）
IPC大类 C30（6） H01（2）
IPC小类 C30B（6）
IPC C30B025/18（3） C30B029/40（3）
发明人 YANG J（6）
公开年 2022（3） 2023（2）
申请年 2022（3） 
专利权人

Reducing damage to substrate when using plasma-enhanced atomic layer deposition to grow thin film involves depositing oxide film on cleaned substrate using water/ozone source and metal source, and depositing nitride film using plasma source.

HU Y, ZHU X, TIAN F, YANG J, LIU H, QIU P, WEI H, ZHENG X, QIU H

Preparing enhanced reduction graphene oxide/carbon nanotube/pyrolytic carbon composite material involves subjecting graphene oxide/carbon nanotube foam to high-temperature thermal reduction to obtain reduced graphene oxide/carbon nanotube foam.

SHAO D, WANG S, LI Y, YANG J, JIA X, SONG H, WANG C, WEI P, ZHANG J, DING S, FENG L

Constant temperature device for crystal growth, has connecting block that is fixedly connected with seed crystal rod whose lower end is connected with crystal through straight slot.

YANG J

Preparing quantum dots, comprises e.g. using two-dimensional materials to prepare two-dimensional material substrates, placing material in growth chamber, spraying raw material on surface of material, and subjecting raw material into adsorption, desorption, and growth on surface of material.

LIU F, WEI Z, YANG J, XIN K, LI L, DI S

Epitaxially growing large area gallium nitride used in field of semiconductor comprises growing graphene two-dimensional material layer on copper (111) single crystal substrate, epitaxially growing gallium nitride film and cooling gallium nitride film to room temperature.

MA Y, YANG J, KONG W

Three-dimensional non-catalytic substrate-loading graphene film structure used for e.g. microelectromechanical system device comprises non-catalytic substrate, etched surface body three-dimensional structure and graphene thin film cover.

DU C, SHEN J, SHI H, YANG J, WEI D, YU C, SONG X, YU Y