国家/地区 | 中国(3) 印度(3) 美国(3) 世界知识产权组织(3) 韩国(2) |
IPC部 |
B(11)![]() |
IPC大类 |
B01(11)
C10(3)
C25(3)
F01(3) C07(2) F02(2) F23(2) F24(2) F25(2) F28(2) |
IPC小类 |
B01J(11)![]() |
IPC |
B01J020/20(3)
B01D053/00(2)
B01D053/04(2)
B01D053/94(2) B01J020/28(2) B01J020/30(2) C25B009/19(2) |
发明人 | |
公开年 |
2023(11)![]() |
申请年 | 2022(7) 2021(2) 2023(2) |
专利权人 |
BAIK J M, CHOI S, RAHULPOLBIA
RAMAKUMAR S S V, KAPUR G S, SHARMA A, SONKAR K, SUNDARRAMAN M, KARUPPANNAN M, CHUGH S, CHAUDHARI C A
CHANDRASEKHAR M, DARAPANENI P, BANERJI A, DOBLE C
GU L, MIAO X, QIAN Y, XIA G
NAKKELLA A K, SWAPNAVAHINI K, BHUKYA B, SRINIVAS B, METRE S G, SUBRAMANYAM M, KUMAR A, HARINI R, DONGRE S B, JAYARAJAN D, LAKSHMINARAYANA S A, ANNAM V
SI L, WANG X, WANG Y, HOU H, LIU Q
PARK K S, CHOI M K, LEE T H, KWON S H, PARK D Y, SHIN C H, PARK K, KI C M, LEE T, PARK D, SHIN C
STOWELL M W, SIENKO L, STOWELL W M
KEMPINSKI W, TRYBULA Z, CHOROWSKI M, CHOLAST K, POLINSKI J, NIECHCIAL J, STOBINSKI L, KOZIEMBA A