国家/地区 中国（7）
IPC部 C（7） B（2） H（2）
IPC大类 C08（7）
IPC小类 C08K（7） C08L（7） C08J（3）
C08G（2）
IPC C08K003/04（7）
发明人 ZHANG J（7）
公开年 2023（7）
申请年 2023（7）
专利权人

Carbon nano-porous frame comprises multiple carbon nano units whose surfaces are connected and assembled to form three-dimensional network framework structure and there are gaps between adjacent carbon nano-units and carbon nano materials and polymers wrapped on surface of carbon nano materials.

KONG L, WANG D, ZHANG J, HUANG S, LI X

Aramid nanofiber wave-absorbing honeycomb material used in stealth aircraft, stealth ships and communication base stations, comprises para-aramid fiber nanofibers and wave-absorbing agent.

ZHANG J, NIE J, TAN J, SONG S, ZHANG M, SUN H, YANG B

Polymer material composition comprises high molecular polymer, lubricant, antioxidant, inorganic filler and coupling agent.

ZHANG J

Preparing carbon nanotube-based flexible temperature-sensitive material by three-dimensional printing, by adding multi-walled carbon nanotubes into deionized water, ultrasonically dispersing in ice bath, solidifying, processing extruded wire rod and shaping by 3D printing.

TANG S, ZHAO Y, LI Y, LI Z, LI B, ZHANG J

High molecular composite flame retardant useful as an additive in plastic and paint, prepared by heating hyperbranched high molecular flame retardant, adding modified graphene oxide and reacting.

ZHANG J, WANG J, LI X, WANG T, CHENG M, WU T

Preparing polystyrene/graphene oxide microspheres used for preparing strain-sensing fabric, involves adding cationic surfactant to polystyrene microsphere solution, mixing, adding graphene oxide solution, and stirring to obtain product.

NI L, QUAN H, CAI G, CHENG D, GUO Q, RAN J, ZHANG J, XIAO M, BI S

Preparing a freely bendable wear-resistant and weather-resistant halogen-free low-smoke cable material used in robot, by using thionyl chloride to modify graphene oxide, mixing dimethylacetamide, acyl chloride graphene, lysine, and pyridine, reacting, filtering, melting, blending, and extruding.

LIN C, ZHANG J, LI Y, LIN Y, ZHAO X, ZENG Q