国家/地区 中国（6）
IPC部 C（6）
IPC大类 C23（6）
IPC小类 C23C（6） C25D（2） G21H（2）
IPC C23C016/26（2） C23C022/53（2） G21H001/06（2）
发明人 YANG Y（6）
公开年 2022（6）
申请年 2021（3）  2022（3） 
专利权人 CHINA NUCLEA.（3）

Anti-counterfeiting transfer film based on polyethylene terephthalate (PET) laser useful in food, medicine comprises PET base film and prepared by coating laser modified paint on PET base film, soaking into bentonite modified glue solution, vacuum aluminum plating to form aluminum plating layer.

XIA H, YUE S, WU J, LEI J, YANG Y

Hot-dip galvanized passivation solution useful in material surface processing technology field for improving corrosion resistance of steel material surface, comprises tannic acid, rare earth metal salt, citric acid, and water.

GE N, YANG Y, ZHU X

Passivating zinc substrate useful in metal material rust prevention involves placing zinc substrate in strong acid solution for activating treatment, placing substrate in conversion liquid and drying, where conversion liquid comprises e.g. ferricyanide, film-forming accelerator and buffering agent.

HU B, YANG Y, LI H

Preparation of graphene-encapsulated ultra-thin nickel-63 radiation source film used in preparation of Schottky junction stacked radiation cell, involves preparing nickel chloride film, and putting graphene/nickel chloride/graphene film in vacuum environment for reduction treatment.

WANG X, WANG L, CHEN Z, YANG Y, ZHANG J, SU C, FENG H, LI P, WU W, LUO T, ZHOU C

Preparation of ultrathin beta-radiation source for micro-components, involves using polymethyl methacrylate/graphene film and platinum sheet, and depositing beta-radiation source on graphene using solution of e.g. beta-radiation source.

ZHANG J, LI C, WANG X, XU P, FENG H, CHEN Z, YANG Y, WU W, ZHOU C, LUO T

Preparing ultra-thin nickel radiation source useful to prepare Schottky junction type laminated beta-radiation cell, involves dripping nickel source on surface polymethyl methacrylate/graphene film and arranging nickel nano particles in oriented mode along direction of magnetic line.

WANG X, WANG L, SU C, FENG H, CHEN Z, ZHANG J, LI P, WU W, YANG Y, ZHOU C