国家/地区 |
中国(10)![]() |
IPC部 |
B(10)![]() |
IPC大类 |
B32(10)![]() |
IPC小类 |
B32B(10)![]() |
IPC |
B32B009/04(10)![]() |
发明人 |
CHOI K(2)
FAN F Y(2)
FAN S(2)
HEIGHT M(2) JIANG K(2) LIN X(2) LIN X Y(2) PARK H(2) PARK H G(2) XIAO L(2) |
公开年 | 2012(3) 2011(2) 2017(2) |
申请年 | 2011(5) 2016(2) |
专利权人 |
HEIQ MATERIA.(2)
HON HAI PREC.(2)
HONGFUJIN PR.(2)
INT BUSINESS.(2)
UNIV TSINGHU.(2) |
GONG M, ZHAO M, LI M, CHEN C, CHEN Q, YANG W, LI Y, WANG Y, LIU B, PEI Z, ZHANG X, LIANG J
CHOI K, PARK H G, HEIGHT M, CHOI K J, PARK H, PIAO H
PARK H G, HEIGHT M, CHOI K, PARK H
JOHNSON B Y, LIU X, MAZUMDER P
AVOURIS P, GARCIA A V, SUNG C, XIA F, YAN H
JIANG K, LIN X, XIAO L, FAN S, LIN X Y, FAN F Y
JIANG K, LIN X, XIAO L, FAN S, LIN X Y, FAN F Y
KWON S, PARK K, YOON E, KWAK J, KWON S Y, YOON U
HASEGAWA MASATAKA, ISHIHARA MASATOU, KOGA YOSHINORI, KIM JAEHO, TSUGAWA KAZUO, IIJIMA SUMIO, HASEGAWA M, ISHIHARA M, KOGA Y, KIM J, TSUGAWA K, IIJIMA S, YOSHINORI K, HO K J, KAZUO T, SUMIO I, MASATAKA H, MASATOU I, JAEHO K