国家/地区 中国（4）
IPC部 C（4）
IPC大类 C01（4） G03（3） C23（2）
H01（2）
IPC小类 C01B（4）
IPC C01B032/194（4）
发明人
公开年 2016（2）
申请年
专利权人

Pellicle film used for preventing dust from adhering to photomask or reticle, comprises layers laminated to each other and/or layers provided with one or more openings.

TAKADA N, SEKI K, KODERA Y, SEKIGAZUNORI, YUTAKA G

Method of making a pellicle for use in extreme ultraviolet (EUV) lithography system, by depositing graphene layer over first material layer, and depositing amorphous silicon layer over graphene layer.

TU C, CHEN C, YOO C S, CHANG J, TSAI C, LIU P, LEE H, LIN C, LIN Y, TU Z, CHEN J, CAI J, YOU Q, ZHANG Z, LIN Z, LIU B, LI X, YOO C

Separating carbon structure including e.g. graphene and carbon nanotube deposited on seed structure, comprises e.g. providing carbon structure into processing chamber, heating carbon structure and seed structure, and supplying etching gas.

MATHARU J, THOMAS S, TEO K B K, JOUVRAY A, JOUBEUREI A, MATARU J, TOMASEU S

Manufacture of molded filter material involves forming support layer on graphene layer formed on initial stage substrate for graphene, forming water passage hole in support layer, and forming water passage hole in graphene layer.

KANEKO K, TAKAGI T, MURATA K, MURADA K, TAKAGE T, TAKAGI H