国家/地区 韩国（2） 世界知识产权组织（2）
IPC部 C（5）
IPC大类 C01（5）
IPC小类 C01B（5）
IPC G03F001/62（3） G03F001/22（2） G03F007/20（2）
发明人
公开年 2023（5）
申请年 2022（2）  2023（2） 
专利权人

Synthesisizing nickel-manganese-sulfur decorated reduced graphene oxide nanocomposite for ultra-fast photocatalytic degradation of organic dyes, involves adding manganese chloride tetrahydrate into stirring solution and treating homogeneous suspension with cetyltrimethyl ammonium bromide.

SASIPRABA T, GOVINDHASAMY M

Pellicle used for reticle for extreme-UV exposure, comprises pellicle film through which extreme-UV rays transmit and support frame for supporting pellicle film, where pellicle film comprises multilayer thin film structure.

KIM Y H, KIMYONGHWAN

Pellicle for use in lithography mask assembly for extreme ultraviolet lithography process in semiconductor manufacturing industry to optically transfer patterns onto a substrate, comprises membrane that includes silicon carbide nanostructures with silicon carbide nanotubes.

ONEILL J, HART A H C

Method for preparing graphene sub-nanoscale gap by feedback control electric breakdown, involves stopping voltage to apply to two ends of single-layer graphene nanoribbon when resistance of single-layer graphene nanoribbon reaches preset resistance to construct and obtain graphene sub-nanoscale gap.

SU M, HONG W, LIU J, ZHANG C, YUAN Z

Pellicle used for exposure to extreme UV rays, comprises substrate having opening formed in central portion, etch stop layer formed on substrate to cover opening, and nanoporous graphene layer in which nanopores are formed on graphene layer, provided on etch stop layer.

KIMHYUNGKEUN, MI K H, KIM S K, JOJINWOO, KIM H Y