国家/地区 Russia（13）
关键词 CVD（13）
出版物 JOURNAL OF NANOELEC.（2）
出版时间 2018（4） 2013（2） 2019（2）
机构 RUSSIAN ACAD.（3） RAS（2）
作者 SEDLOVETS DM（4） KNYAZEV MA（3） OBRAZTSOVA E.（3） BOYKO EV（2）
KONDRASHOV I.（2） KOSTOGRUD IA（2） NAUMOV AP（2） POZHAROV AS（2）
RUSAKOV PS（2） RYBIN MG（2） SMOVZH DV（2） TROFIMOV OV（2）

Graphene-like film CVD on e-beam exposed SiO2/Si by the pyrolysis of different oxygen-containing precursors

FULLERENES NANOTUBES CARBON NANOSTRUCTURES

SEDLOVETS DM, KNYAZEV MA, TROFIMOV OV, KOVESHNIKOV SV

The influence of the crystallographic orientation of the copper catalytic substrate crystallites on the mechanical transfer of graphene

MATERIALS RESEARCH EXPRESS

BOYKO EV, KOSTOGRUD IA, BEZRUKOV IA, KRIVENKO AS, SMOVZH DV

Few-layer graphene formation by carbon deposition on polycrystalline Ni surface

APPLIED SURFACE SCIENCE

LOGINOV AB, BOZHEV IV, BOKOVASIROSH SN, OBRAZTSOVA ED, ISMAGILOV RR, LOGINOV BA, OBRAZTSOV AN

The main sources of graphene damage at transfer from copper to PET/EVA polymer

MATERIALS CHEMISTRY PHYSICS

KOSTOGRUD IA, BOYKO EV, SMOVZH DV

Chemical Vapor Deposition Synthesis of Large-Area Graphene Films

JOURNAL OF STRUCTURAL CHEMISTRY

NIKOLAEV DV, POPOV VI, TIMOFEEV VB, SMAGULOVA SA

Large positive magnetoresistance of graphene at room temperature in magnetic fields up to 0.5 T

SCRIPTA MATERIALIA

MATVEEV VN, LEVASHOV VI, KONONENKO OV, VOLKOV VT

The control of graphene-like film CVD on pre-exposed substrate by varying an e-beam exposure dose

MATERIALS LETTERS

KNYAZEV MA, SEDLOVETS DM, TROFIMOV OV

Chemical Vapor Deposition of Graphene on Copper Foils

JOURNAL OF NANOELECTRONICS OPTOELECTRONICS

RUSAKOV PS, KONDRASHOV II, RYBIN MG, POZHAROV AS, OBRAZTSOVA ED

Chemical Vapor Deposition of Graphene on Nickel from Different Gaseous Atmospheres

JOURNAL OF NANOELECTRONICS OPTOELECTRONICS

KONDRASHOV II, RUSAKOV PS, RYBIN MG, POZHAROV AS, OBRAZTSOVA ED

Defect concentration in nitrogen-doped graphene grown on Cu substrate: A thickness effect

PHYSICA BCONDENSED MATTER

SHARMA DK, FATEIXA S, HORTIGUELA MJ, VIDYASAGAR R, OTEROIRURUETA G, NOGUEIRA HIS, SINGH MK, KHOLKIN A