国家/地区 中国（8）
IPC部 C（6） B（3） H（2）
IPC大类 C01（5） B01（2） H01（2）
IPC小类 C01B（5） B01J（2）
IPC C01B031/04（5）
发明人 HAN B（8）
公开年 2012（3） 2013（2） 2016（2）
申请年 2010（3）  2012（2） 
专利权人 NAT CENT NANOSCIENCE TECHNOLOGY CHINA（8）

Aza-graphene and manganese dioxide hybrid aerogel for use in lithium ion batteries, comprises three-dimensional network structure composed of aza-dimensional graphene sheet layers, and aza graphene sheet loaded manganese dioxide particles.

HAN B, SUI Z, YANG Q

Functional graphene material useful as e.g. organic vapor adsorbent comprises two-dimensional graphene sheet layer as basic building block for forming three-dimensional porous network structure.

HAN B, SUI Z

Preparing porous graphene, comprises mixing graphite alkene or graphene oxide with an etchant, carrying out carbothermal reaction under anaerobic conditions, and carrying out acid treatment to remove the un-reacted and reacted etchant.

HAN B, ZHOU D

New graphene oxide-based imidazole porous polymer useful in carbon dioxide adsorption and supercapacitor, prepared by crosslinking o-diamino compound with graphene oxide or its derivative.

WEI Z, CHENG Q, ZHOU D, HAN B, WU H, CUI Y

Preparation of graphene oxide film involves adding water to aqueous solution of graphite oxide, performing ultrasonic treatment, centrifuging, adding mixed solvent, performing Langmuir-Blodgett method and transferring film to substrate.

ZHOU D, CHENG Q, HAN B, WANG T, CUI Y

Hydrogel system useful for sustained-release of drug, comprises block copolymer modified graphene and/or graphene oxide, drug molecule and cyclodextrin hydrogel.

CHENG Q, HAN B

Forming graphene oxide pattern, comprises e.g. preparing substrate, forming self-assembling monomolecular film on substrate, covering film using mask to expose, and removing mask to obtain self-assembling monomolecular film template.

CHENG Q, HAN B, SUN S, WU C

Forming graphene oxide pattern, comprises e.g. preparing substrate, preparing hydrophobic self-assembly monomolecular film on surface of substrate, and exposing the film by mask to ultraviolet lamp, and removing mask after exposure.

CHENG Q, ZHOU D, WU C, SUN S, HAN B