国家/地区 日本（7） 台湾（4） 世界知识产权组织（4） 美国（2）
IPC部 C（7） B（4） H（4）
IPC大类 C01（7） B82（4） H01（4）
IPC小类 C01B（7）
IPC C01B031/02（7） B82Y040/00（4） B82Y030/00（3）
C01B031/04（3） C01B032/182（2） H01L021/28（2）
H01L021/285（2） H01L021/3205（2） H01L021/336（2）
H01L021/768（2） H01L023/532（2） H01L029/06（2）
H01L029/417（2） H01L029/78（2）
发明人 HASEGAWA M（3） ISHIHARA M（2） KAWABATA A（2）
SATO S（2） YAMADA T（2）
公开年 2014（7）
申请年 2013（4）  2012（2） 
专利权人 NAT INST ADVANCED IND SCI TECHNOLOGY（7）

Defect repairing method of graphene film e.g. planar crystalline carbon film, involves irradiating laser by giving carbon source to portion identified as defect portion of film, and restoring local defect of film.

OKIKAWA Y, ISHIHARA M, OMURA H, HASEGAWA M

Graphene film for manufacture of electronic apparatus, comprises preset number of six-membered carbon rings which are linked and aligned in short direction, and edge structure along long direction which is completely of armchair-type.

YAMAGUCHI J, SATO S, YAMADA H, TANAKA K, YAMADA Y

Wiring structure used for semiconductor device e.g. large scale integration, comprises carbon nanotubes and graphene, which are connected electrically through metal block.

SATO S, KONDO D, SATO M, NIHEI M, KONDO T

Graphene structure used for transparent electrode, comprises substrate, base which is formed on top of substrate, and vertical graphene which grows from base and stands in vertical direction with respect to surface of substrate.

KAWABATA A

Graphene-carbon nanotube structure for refinement of wiring in semiconductor device, has substrate, base formed on substrate, vertical graphene which grows from base, and stands in vertical direction with respect to substrate surface.

KAWABATA A

Manufacture of graphene laminated body for e.g. transparent conductive film involves transferring graphene film to to-be-transferred material using intermediate media, crimping intermediate media, and removing base material.

ISHIHARA M, YAMADA T, HASEGAWA M

Graphene roll film has graphene film having wrinkle portion having specified width and central line average roughness, provided in base material.

YAMADA T, HASEGAWA M, TSUKAHARA N, SHIMADA N, YAZAWA K, KIM J H