国家/地区 韩国（8）
IPC部 C（6） H（4） B（3）
IPC大类 C08（4） C09（3） H01（3）
B32（2） C01（2） C23（2）
IPC小类 C08K（3） C09D（3） B32B（2）
C01B（2） C08J（2） C23C（2）
H01L（2）
IPC C09D007/61（3） C09D175/04（3） C01B031/02（2）
C08K003/013（2） C08K003/04（2） C09D007/40（2）
C23C016/26（2）
发明人 KIM T H（8）
公开年 2022（2） 2023（2）
申请年 2021（3） 
专利权人 LG ELECTRONI.（2） PUREMANN INC（2）

New ethynyl benzene-based crosslinking precursor used for copolymer of gel polymer electrolyte used in electrochemical device.

KIM T H, KIM S H, JANG J K, LEE J Y, JANG J G

Composition used in production of heat-dissipating paint, comprises binder resin comprising urethane resin or epoxy resin, thermally conductive particles comprising expanded graphite particles having preset diameter and metal particles, additives comprising anti-settling agent, and solvent.

HUN L S, SONG J, CHOI S, YUMINSOOK, KIMTAEHAN, LEE S H, SONG J H, CHOI S I, YU M S, KIM T H

One-component urethane heat dissipation paint composition e.g. for coating heat dissipation coating film, comprises e.g. polyol, thermally conductive particles including graphite, additives, block diisocyanate and acetate-based solvent.

KIMTAEHAN, HUN L S, YOUK S K, YUMINSOOK, KIM T H, LEE S H, YU M S

Cooling of semiconductor component for e.g. heat sink, involves arranging metal layer between component and heat dissipation coating layer, forming coating layer by using heat dissipation coating composition containing urethane binder resin, and exfoliating thermally conductive particles.

KIMTAEHAN, HUN L S, CHOI S, SHIM Y, SONG J, KIM T H, LEE S H, CHOI S I, SIM Y H, SONG J H

Cooking appliance, such as a microwave oven comprises a housing that includes a cavity, door that is connected to housing, IH heating module that emits magnetic field toward cavity, and working coil that generates the magnetic field.

SHIN J, SIM S, HA J, KIM T, LEE Y, SHIN J Y, SIM S H, KIM T H, SU L

Method for manufacturing low friction element for forming graphene pattern in engine parts of automobile industry, involves growing graphene in metal solid lubricant through CVD alloy using catalyst.

LEE S W, KIM S H, KIM T H, CHO S H, GODINDA G, BHUPENDRA J, TRIPATHI K, JEONG S H, GYAWALI G, JOSHI B, KHAGENDRA T

Manufacture of graphene involves loading catalytic metal layer into chamber, applying tensile force to catalytic metal layer, supplying carbon source to chamber, applying tension, and forming graphene on catalytic metal layer.

MOON J, RHO J, PARK S, KIM T, HONG B, PARK W, JUNG M, KIM T H, ROH J

Gas barrier film used for flexible substrate, has primary graphene layer formed on macromolecular film, and membranous polymer film.

KIM T H, KIM Y K, KEE S B, KIM S K, IM C G, HO K T, GWON K Y, BEOM G S, GUK K S, GYU I C