国家/地区 韩国（6） 美国（6） 中国（3） 世界知识产权组织（3）
IPC部 C（6） B（5） H（2）
IPC大类 C01（6） B82（4） B29（3）
B32（3） B05（2） C23（2）
H01（2）
IPC小类 C01B（6） B29C（3） B32B（3）
B82Y（3） B05D（2） B82B（2）
C23C（2）
IPC C01B031/02（4） C01B031/04（4） B82Y030/00（3）
B32B037/02（2） B32B037/10（2） B32B037/14（2）
B32B038/10（2） B82B003/00（2） B82Y040/00（2）
发明人 WON D（6）
公开年 2012（5）
申请年 2011（6）
专利权人 HANWHA TECHW.（6） SAMSUNG TECH.（6）

Fabricating multi-layered graphene, by disposing a first graphene layer on a carrier, disposing a second graphene layer on the first graphene layer to form a graphene sheet, transferring the graphene sheet, and removing the carrier.

HONG B, KIM N, NA D, SONG Y, WON D, YOON J, HONG B H, NA D H, SONG Y I, WON D K, YOON J H, KIM N Y

Graphene transferring method involves compressing catalyst metal film and substrate film using initial roller, and separating substrate film from metal film.

NA D, YOON J, SONG Y, WON D, NA D H, YOON J H, SONG Y I, WON D K, YUAN D

Post-treating method of graphene used for e.g. biosensor, involves forming metal thin film on graphene, disposing liquid phase carrier on graphene, hardening carrier, and separating carrier and graphene from metal thin film.

WON D, CHO S, YOON J, NA D, WON D K, CHO S M, YOON J H, NA D H, YUAN D

Method of manufacturing grapheme used in FET, involves forming graphene on catalyst layer by cooling catalyst layer, and taking out supporting belt, on which catalyst layer is loaded and graphene is formed, from chamber to outside.

CHO S, WON D, CHO S M, WON D K, CHO S H

Graphene manufacturing apparatus, comprises gas supplying unit for supplying gas, gas heating unit for heating gas, deposition chamber in which substrate is disposed and inlet pipe for supplying the gas into deposition chamber.

WON D, CHO S, WON D K, YUAN D

Method for transferring graphene from graphene forming structure onto desired object e.g. circuit substrate, involves separating oxide layer from metal catalyst layer and removing metal catalyst layer by using etching solution.

CHO S, WON D, CHO S H, WON D K