国家/地区 中国（3） 美国（3） 欧洲专利局（EPO）（2） 日本（2） 世界知识产权组织（2）
IPC部 C（5）
IPC大类 C23（5）
IPC小类 C23C（5） C30B（5） C01B（2）
IPC C23C016/26（5）
发明人
公开年 2021（3） 2020（2）
申请年 2020（5）
专利权人

Coating metal workpiece e.g. electrical connector, involves exposing workpiece to carbon-containing precursor gas and hydrogen gas at preset flow rate and total gas pressure, and exposing to carbon-containing precursor gas and carrier gas.

ADAMS H J

Formation of porous graphene layer used as semipermeable membrane, involves providing catalytically active substrate comprising copper-nickel alloy substrate, to catalyze graphene formation under chemical vapor deposition conditions.

CHOI K, PARK H G, HEIGHT M, CHOI K J, PARK H, PIAO H

Multi-chamber semiconductor thin film epitaxy device comprises growth chambers and mechanical arm, where growth chambers have graphene and semiconductor material growth chamber, where graphene growth chamber used to grow graphene film.

GUO L, WEI T, RAN J, WANG J

Nonenzymatic glucose sensor fabrication involves providing bottom substrate, preparing graphene layer on bottom substrate, depositing multiple amount of zinc oxide seed crystals on graphene layer, and then growing zinc oxide seed crystals.

CHEN H, SU W, YEH Y, CHANG C

Pretreating graphene growth substrate comprises using copper foil or copper-nickel alloy foil as the base, polishing base, placing in tube furnace for annealing, taking annealed substrate of tube furnace, and polishing.

HAO Y, NIU W