国家/地区 日本（7）
IPC部 C（7）
IPC大类 C01（7） H01（7） C23（3）
H05（3） C30（2）
IPC小类 C01B（7）
IPC C01B032/186（4） C23C016/26（3） H01L021/205（3）
C01B032/182（2） C01B032/194（2）
发明人 WADA M（3） IFUKU R（2） LI L（2）
MATSUMOTO T（2）
公开年 2022（7）
申请年 2022（7）
专利权人 TOKYO ELECTR.（4）

Graphene composites material used as heat dissipating/heat dissipating material, comprises aerosol-deposited film of graphene and functional material particles, where graphene particles are stacked to exhibit c-axis orientation, and functional material particles are subsumed by graphene particles.

WATANABE M, SUGIMOTO S

Substrate processing includes taking substrate into processing vessel, removing oxygen-containing layer on substrate using plasma of gas mixture including hydrogen-containing gas, and forming nucleation layer and graphene film on substrate using plasma of gas mixture including carbon-containing gas.

IFUKU R, MATSUMOTO T, WADA M, KABUKI N

Upper electrode assembly used in plasma processing apparatus, has heat transfer sheet that is mounted between electrode plate and metal plate and having vertically oriented portion with vertically oriented graphene structures.

TSUJIMOTO H, KOBUNE T, LI L, LEE L, KOBUNEDAKAKI

N-type composite material used for thermoelectric conversion element, temperature sensor, infrared sensor, field effect transistor, complementary metal oxide semiconductor, or solar cell, comprises amidine compound and/or guanidine compound, and nanocarbon material or nanocarbon material aggregate.

HORIIE S, KIRIHARA K, MUKODA M, WEI Q Y, KATO Y, MONOBE H, SUGINO T

Processing substrate by loading substrate into processing container, forming carbon film on substrate with plasma of mixed gas containing carbon-containing gas while inside of processing container is maintained at pressure, and changing inside of processing container.

WADA M, IFUKU R, MATSUMOTO T, YAMADA H, TAKASHI M

Film formation method involves forming metal film on silicon-containing film of substrate, forming a graphene film on metal film, where metal film is silicided by heating metal film, and continuously performing film forming process.

UEDA H, WADA M, ZHEN

Weakly coupled enhanced graphene film for use in graphene photoelectric device, comprises an enhanced graphene structure based on weak coupling, where the enhanced graphene structure based on weak coupling comprises many graphene units stacked vertically; the graphene unit is a single graphene sheet.

LIU Y, FANG W, LI L, PENG L, GAO C, GOO C, FENG L, WEE D