国家/地区 中国（5） 美国（3） 世界知识产权组织（2）
IPC部 C（8） B（3）
IPC大类 C07（8）
IPC小类 C08K（8） C08L（7） C07C（3）
C07D（3） C08G（2） C08J（2）
C09K（2）
IPC C08K003/04（8）
发明人 ZHU C（2）
公开年 2021（8）
申请年 2021（5）  2020（3） 
专利权人

Polymeric composition used in article of manufacture, comprises copolymer with recurring unit containing 1-methyl-3-(4-(4-methyl-benzoyl)-phenyl)-1,3-dihydro-benzoimidazol-2-one having compound and recurring unit containing (4-(4-hydroxy-phenoxy)-phenyl)-phenyl-methanone having compound.

WANG Y

New ionic organic compound for nano carbon-material dispersion liquid, composite solid and for manufacturing the nanocarbon-material film.

MATSUSAWA Y, KOTOKU H

Acrylic metal salt composition for resin composition, is prepared by making acrylic acid, divalent metal oxide, and thermally conductive powder in non-polar solvent, and removing solvent to obtain metal acrylate composition.

TSOU C P, CHIU K, CHEN Z, HUANG T T, HUANG T, TSOU C

Corrosion-resistant battery casing comprises PVC resin, anti-aging agent, talc powder, kaolin powder, paraffin wax, dibutyl phthalate, where anti-aging agent is made by adding cyanuric chloride, chlorobenzene into the reaction kettle.

ZHU Q, MAO R, LIU K, HAN Y, LIU J, ZHU C

Producing reversible hemiaminal or aminal gel composition used in 3D printing, involves preparing liquid precursor composition, where liquid precursor composition operable to remain in first liquid state at about room temperature.

BOUL P

Lightweight and porous rubber material comprises butyl rubber, dichloromethane, flame retardant filler, and pore-forming agent.

CAI L

Breathable antistatic foam material is prepared by mixing low density polyethylene, glyceryl monostearate, talc, antistatic agent, flame-retardant particles and nucleating agent, mixing with foaming agent, adding in mold and foaming.

LUO W

Preparing graphene-lignin two-dimensional composite material used in adsorption and separation of metal ions and purification of proteins, involves dissolving graphene and dopamine in tris(carboxymethyl)aminomethane-hydrochloric acid buffer.

ZHUANG W, QIU J, ZHU C, YING H, LONG H, TANG C, LI M, YANG P, SHEN T, TAN Z