国家/地区 德国（5）
IPC部 C（5）
IPC大类 C23（5）
IPC小类 C23C（5） C01B（3）
IPC C23C016/44（5）
发明人 TEO K B K（3） CONRAN B R（2） MCALEESE C（2）
公开年 2021（2） 2022（2）
申请年 2020（2）  2021（2） 
专利权人 AIXTRON SE（3）

Deposition of two-dimensional layers on substrate in process chamber, involves heating substrate, feeding reactive gas of carbon-containing chalcogenide, and adjusting substrate temperature, process chamber pressure, and partial pressure of reactive gas so that graphene is deposited as layer.

MCALEESE C, CONRAN B R, TEO K B K

Deposition of two-dimensional layer on substrate in process chamber of chemical vapor deposition reactor, involves feeding one or more reactive gases into a process chamber and depositing spaced apart crystalline regions on surface of substrate under specific process parameters.

MCALEESE C, CONRAN B R, TEO K B K

Method for production of atomic bilayer nanotape, involves oxidizing portion of monolayer to provide oxidized portion, and removing oxidized portion to provide atomic layer nanotape comprising transition metal dichalcogenide material.

HARUTYUNYAN A R, LI X

Forming layer, comprises e.g. exposing substrate to aromatic precursor in processing chamber, rinsing aromatic precursor from processing chamber, and heating substrate deposit graphene hard mask layer on substrate.

BHUYAN B J, LEONCINI A

Apparatus for separating carbon-containing structures in form of nanotubes or graphene, has plate-shaped component that is arranged in process chamber housing and inserted in retaining recess formed in wall of process chamber housing.

RIPPINGTON D E, JOUVRAY A, RUPESINGHE N L, TEO K, TEO K B K, RUPESINGHE N