国家/地区 欧洲专利局（EPO）（6）
IPC部 C（6）
IPC大类 C23（6）
IPC小类 C23C（6） C01B（4） H01L（3）
G03F（2）
IPC C23C016/26（6）
发明人 BYUN K（2） BYUN K E（2） LI Y（2）
SHEN X（2） SHIN H（2） SHIN H J（2）
SHIN K（2） SHIN K W（2）
公开年 2022（6）
申请年 2021（5） 
专利权人 SAMSUNG ELEC.（2）

Visualizing distribution and intrinsic orientation of periodically spaced one-dimensional structures by depositing electrically conductive solid film of imaging material onto surface of two-dimensional material, providing polarization microscope, and imaging layered composite at acquisition angles.

AMADO E, KRESSLER J

Nanocrystalline graphene used for complementary metal-oxide-semiconductor process, comprises grains in stack of graphene sheets.

KIM S, BYUN K, CHO Y, SHIN K, LEE E, LEE C, SONG H, SHIN H, YOON J, LEE S, LIM H, BYUN K E, CHO Y C, SHIN K W, LEE C S, SONG H J, SHIN H J, SU Y J, LEE S Y, LIM H S, LI Z, YOUN J, SHEN X, LI C, LI Y, ZHAO L, JIN S

Use of protective graphene coating involves depositing graphene on substrate to produce composite, removing substrate or graphene, and depositing graphene membrane on glassy surface for providing protection for screen and display case of two or three dimensional artwork e.g. museum.

GALIOTIS C, ANAGNOSTOPOULOS G, PASTORE CARBONE M G, PATERAKIS G, KOTSIDI M, GORGOLIS G

Cathode active material e.g. for lithium secondary battery, comprises e.g. silicon-containing coating layer formed inside pores or on surfaces of carbon-based particles, and carbon coating layer formed on silicon-containing coating layer.

PARK G O, YOO S K, JANGDONGIL, CHUNG J H, JANG D I, ZHENG Z, ZHANG D, YU S, PARK G

Method for forming interconnect structure for semiconductor devices, involves forming carbon layer having bonding structure on first metal layer of substrate, and forming second metal layer of substrate electrically connected to first metal layer.

LEE Y, SHIN H, SHIN J, BYUN K, LEE W, AHN S, SHIN K, SHIN K W, BYUN K E, SHIN H J, LEE Y S, SHEN X, LI Y

Removing polymethylmethacrylate (PMMA) from graphene surface by subjecting PMMA layer to deep UV light irradiation, treating irradiated PMMA layer to remove PMMA layer and drying cleaned layer located on substrate in stream of nitrogen gas.

ALEXEEVA N, KASALYNAS I