国家/地区 |
日本(8)![]() |
IPC部 |
B(8)![]() |
IPC大类 |
B32(8)![]() |
IPC小类 |
B32B(8)![]() |
IPC |
B32B009/04(8)![]() |
发明人 |
CHOI K(2)
FAN F Y(2)
FAN S(2)
HEIGHT M(2) JIANG K(2) LIN X(2) LIN X Y(2) PARK H(2) PARK H G(2) XIAO L(2) |
公开年 | 2012(2) 2017(2) |
申请年 | 2011(3) 2016(2) |
专利权人 |
HEIQ MATERIA.(2)
HON HAI PREC.(2)
HONGFUJIN PR.(2)
UNIV TSINGHU.(2)
|
CHOI K, PARK H G, HEIGHT M, CHOI K J, PARK H, PIAO H
PARK H G, HEIGHT M, CHOI K, PARK H
JOHNSON B Y, LIU X, MAZUMDER P
SEACRIST M R, BERRY V, NGUYEN P T
JIANG K, LIN X, XIAO L, FAN S, LIN X Y, FAN F Y
JIANG K, LIN X, XIAO L, FAN S, LIN X Y, FAN F Y
HASEGAWA MASATAKA, ISHIHARA MASATOU, KOGA YOSHINORI, KIM JAEHO, TSUGAWA KAZUO, IIJIMA SUMIO, HASEGAWA M, ISHIHARA M, KOGA Y, KIM J, TSUGAWA K, IIJIMA S, YOSHINORI K, HO K J, KAZUO T, SUMIO I, MASATAKA H, MASATOU I, JAEHO K
SUEMITSU M, KONNO A, MIYAMOTO Y, MAKI S, ASSEUSI G, YU M