国家/地区 美国（13）
IPC部 C（13）
IPC大类 C07（13） C01（10） C08（5）
B01（4） H01（4） B82（3）
IPC小类 C07B（13）
IPC C01B031/04（7） C07B061/00（6） C01B031/02（5）
C07C025/22（5） B01J021/18（4） C08G061/10（4）
B01J037/34（3） B82Y030/00（3） B82Y040/00（3）
C07C015/14（3） C07C015/20（3） B01J023/44（2）
B01J023/50（2） B01J023/745（2） B01J023/75（2）
发明人 FENG X（3） MUELLEN K（3） MULLEN K（3）
ITAMI K（2） SCHVAB M G（2） SCHWAB M G（2）
SCHWAB M G S（2）
公开年 2015（3） 2011（2） 2013（2） 2014（2） 2021（2）
申请年 2012（3）  2014（3）  2011（2）  2013（2） 
专利权人 BASF CHINA C.（3） BASF SE（3） MAX PLANCK G.（3） BASF AG（2）

Manufacture of naphthyl silole compound used for preparing graphene nanoribbons, involves reacting brominated/iodinated biphenyl compound with lanthanoid-and-lithium-containing ate complex, and reacting obtained lanthanoid complex with silyl compound.

ITAMI K, ITO H, MATSUSHIMA K, MURAKAMI K, NAKATSUJI H, ISHIDA S

Alkane dehydrogenation catalyst used for producing hydrogen production apparatus, comprises graphene atom vacancy structure, 3-hydrogenated atom vacancy structure and nitrogen-substituted atom vacancy structure.

KUSAKABE K, TAKAI K, NISHIKAWA M, LIU M, KAZUYUKI T A

Production of graphene material involves dispersing starting graphitic material in liquid medium to form graphite suspension and introducing graphite suspension into hydrodynamic cavitation reactor that exfoliates graphene planes.

BURTON D J, JANG B Z, ZHAMU A

Hydrogenation catalyst used for hydrogenation of biomass-derived hydrocarbon compound, comprises inorganic nanoparticles and nitrogen-doped reduced graphene oxide support for supporting inorganic nanoparticles.

KIM D, SINGH A K, KIM D P, AJAY, PYO K D

Separating echelon from Camellia nitidissima, comprises e.g. extracting materials by using graphene nano-materials as selective adsorption separation carrier, controlling pH, and adjusting isoelectric point of amino acid active component.

CHENG J

Organic-semiconductor film used for channel in transistor structure, has pseudo graphene structure including two-dimensional network structure which is formed continuously.

KAGAYA M, MATSUMOTO T, KATO D, KATO T

Edge-halogenation of graphene material used for electronic/optical/optoelectronic device involves reacting graphene material e.g. graphene, graphene nanoribbon, and/or graphene molecule with halogen-donor compound in presence of Lewis acid.

HINTERMANN T, MUELLEN K, FENG X, TAN Y, MULLEN K, TAN Y Z

New oligophenylene monomers, useful for synthesizing polymeric precursors for preparing graphene nanoribbons.

IVANOVICI S, SCHWAB M G S, FENG X, MUELLEN K, SCHWAB M G, MULLEN K, KLAUS M, SCHVAB M G, SCHWAB M, MILLEN K

New graphene nanoribbon precursors comprising polycyclic aromatic hydrocarbon repeat units, used in graphene nanoribbons for field-effect transistors.

SCHWAB M G S, MUELLEN K, FENG X, DOESSEL L, SCHWAB M G, MULLEN K, DOSSEL L, SCHVAB M G

Manufacture of optionally substituted aryl group-substituted polycyclic aromatic compound used for manufacturing graphene, involves reacting polycyclic aromatic compound and boron compound substituted by optionally substituted aryl group.

ITAMI K, MOCHIDA K, KAWASUMI K, SEGAWA Y, KAJINO T