国家/地区 美国（7） 中国（2） 德国（2） 世界知识产权组织（2）
IPC部 B（7）
IPC大类 C23（7）
IPC小类 C23F（7）
IPC C23F001/02（7）
发明人 MAAROUF A（4） MARTYNA G J（4） AFZALIARDAKANI A（3）
SAENGER K（3）
公开年 2013（2） 2015（2）
申请年 2011（3）  2015（2） 
专利权人 INT BUSINESS.（4） EGYPT NANOTE.（2） EGYPT NANOTE.（2） MAAROUF A（2）
MARTYNA G J（2）

Optically infrared-transparent conductor for use in infrared imaging technologies, has graphene layer placed on network forming nanohybrid layer of graphene layer and network, and passivation layer palced on portion of nanohybrid layer.

SON K

Method for forming patterned graphene layer on substrate of electronic device, involves removing patterned structure to produce patterned graphene layer on substrate, where patterned graphene layer on substrate provides carrier mobility.

AFZALIARDAKANI A, MAAROUF A, MARTYNA G J, SAENGER K

Graphene nanomesh structure for providing carrier mobility for electronic devices, has graphene that is reacted with patterned structure to remove graphene regions of patterned structure of carbide-forming metal or metal-containing alloy.

AFZALIARDAKANI A, MAAROUF A, MARTYNA G J, SAENGER K

Formation of patterned graphene layer on substrate used for low-noise amplifier, involves forming patterned structure(s) of carbide-forming metal or metal-containing alloy on substrate, applying layer of graphene and heating.

AFZALIARDAKANI A, MAAROUF A, MARTYNA G J, SAENGER K, AFZALIARDAKANI A C O I

Forming cleaned nanotube-graphene hybrid thin film on a substrate, comprises depositing the nanotube thin-film over a substrate to produce a layer of nanotube thin-film, and removing impurities from surface of layer of nanotube thin-film.

BOL A A, CHANDRA B, KASRY A, MAAROUF A, MARTYNA G J, TULEVSKI G S

Making a graphene composite structure used as electrode involves growing a graphene film on the first surface of the metal substrate by a chemical vapor deposition method; and etching the metal substrate from the second surface.

JIANG K, LIN X, XIAO L, FAN S, LIN X Y, FAN F Y

Forming a nano-perforated graphene material, comprises forming an etch mask defining an array of holes over a graphene material and patterning the array of holes into the graphene material.

ARNOLD M, GOPALAN P, SAFRON N S, KIM M, ARNOLD M S