国家/地区 世界知识产权组织（6）
IPC部 C（6）
IPC大类 G03（6）
IPC小类 G03F（6） C01B（2） C09D（2）
H01L（2）
IPC G03F001/62（3） G03F007/004（2） H01L021/02（2）
H01L021/027（2）
发明人
公开年 2021（6）
申请年 2020（3）  2021（2） 
专利权人

Manufacturing graphene-metal composite pellicle containing graphene by forming metal catalyst layer on silicon substrate, forming core layer by growing graphene, forming protective layer, forming heat dissipation layer and forming pellicle frame composed of silicon substrate-metal catalyst layer.

KIM H, LEE G, KIMHYUNGKEUN

Pellicle film used for preventing dust from adhering to photomask or reticle, comprises layers laminated to each other and/or layers provided with one or more openings.

TAKADA N, SEKI K, KODERA Y, SEKIGAZUNORI, YUTAKA G

Composition used in forming thin film, comprises chemical contrast pattern having first region of first chemistry on background of second chemistry, and microphase-separated block copolymer material overlying the chemical contrast pattern.

ARNOLD M, JACOBBERGER R, NEALEY P, XIONG S, CHANG T, MA Z, NEALEY P F

Three-dimensional structure for electrical signal detection device, has support layer that is arranged between layer containing carbon single-atomic layer material-containing layer and curve-inducing layer.

KOJI S, TETSUHIKO T, HIROKI M, YUKO U, UENO Y, MIYAZAKO H, TESHIMA T, SAKAI K

Photo-resist welding ink useful for light-emitting diode display printed circuit board boards, comprises oligomer, photoinitiator, nano black filler, flatting agent, coupling agent and solvent, epoxy resin and functional monomer.

LI X, XU X, XIA J, GAN Z, WU L

Composition used for fabricating semiconductor structure on semiconductor device for removing metal-containing layer of pellicle structure, comprises water, oxidizing agent(s), and acid(s).

CHEN C, CHANG C, LEE Y, LIU W D, WINDOW C, LEE W, LU W, LIU W, LI Y, ZHANG Z, CHEN Z