国家/地区 韩国（5）
IPC部 C（5）
IPC大类 C23（5） C01（2） H01（2）
H05（2）
IPC小类 C23C（5） C01B（2） H01J（2）
H01L（2） H05H（2）
IPC C23C016/44（5）
发明人 IFUKU R（2） MATSUMOTO T（2） SUGIURA M（2）
UEDA H（2） WADA M（2）
公开年 2021（4）
申请年 2020（5）
专利权人 TOKYO ELECTR.（2）

Depositing thin film, comprises preparing mixture of cyclohexanone and graphene oxide, supplying the mixture into chamber, and depositing thin film using plasma enhanced chemical vapor deposition by providing radio frequency power.

YOON S Y, YOOK J, JAI L H, SHIM W P

Film forming by cleaning interior of treatment container, extracting and removing oxygen inside treatment container, introducing substrate into treatment container, and forming carbon film on substrate by plasma chemical vapor deposition.

MAKOTO W, TAKASHI M, NOBUTAKE K, RYOTA I, MASAHITO S, HIROKAZU U, MATSUMOTO T, KABURAGI N, IFUKU R, SUGIURA M, UEDA H, WADA M, KABUKI N

Depositing large-area graphene layer involves forming titanium layer on substrate by sputtering, and reducing titanium layer by spraying a reductant gas and a purge gas onto the titanium layer when it is moved in a first direction.

EOM J H, YOON S G, HAN J H, SONG C K, YOON D H, YOUN D H, GYU S

Composition useful as catalysts and electrodes, comprises a nanoporous carbon powder comprising nanopores having disposed in it copper metal nanostructures and an elemental copper nanowires.

NAGEL C J, BRODEUR C L, NAZEL C A J, BRODARD C L

Processing device for forming film, consists of processing container having thermal sprayed ceramic coating on inner wall, mounting table for holding substrate and control unit for performing precoating and film forming.

WADA M, MATSUMOTO T, SUGIURA M, IFUKU R, UEDA H, KURYOTA L