国家/地区 中国（10） 台湾（6） 美国（6） 世界知识产权组织（6） 韩国（4） 日本（3） 德国（2）
IPC部 C（17）
IPC大类 H01（17） C23（10） C01（6）
B82（3） C09（3） C08（2）
IPC小类 H01J（17）
IPC H01J037/32（9） C23C016/26（7） H01L021/02（4）
C01B032/184（3） C23C016/44（3） C23C016/455（3）
H01J009/02（3） H01L021/285（3） H01L021/768（3）
B82Y040/00（2） C01B032/186（2） C23C014/35（2）
C23C016/02（2） C23C016/04（2） C23C016/46（2）
发明人 SHIN H（2） SHIN H J（2） WANG B（2）
YIN Y（2）
公开年 2022（10） 2021（6）
申请年 2021（17）
专利权人 APPLIED MATE.（3） SAMSUNG ELEC.（2）

Device for producing graphene layer, has one electrode which is connected to positive pole of voltage source, and other electrode that is connected to negative pole and is provided for carbon ions accumulate in graphene attachment region so as to form graphene layer.

KREISCHER U

Producing photoluminescence material involves placing plastic piece into working solution which is water, applying micro-plasma onto surface of the working solution, and degrading the plastic piece into multiple smaller molecular and graphene quantum dot.

CHIANG W, WENG R, WENG R J

Apparatus for depositing two-dimensional material, comprises planar high-frequency antenna formed on second surface of dielectric window, and first gas nozzle configured to provide source gas into chamber.

SHIN H, SHIN K, LEE C, LEE C S, SHIN K W, SHIN H J

Depositing graphene layer on substrate in plasma enhanced chemical vapor deposition of graphene at low temperatures, involves providing substrate within modular microwave plasma chamber, and flowing carbon source and hydrogen source into modular microwave plasma chamber.

KRAUS P A, NGUYEN H, MEBARKI B, WANG C, VALENCIA C, CHUA T C

Formation of material film used in electronic device, by forming material film on partial region of substrate using sputtering process, removing non-photosensitive mask from substrate, and heat-treating substrate and material film.

JUNG J, KIM T, ZHAO P, SHIN M, SHIN H, SEOL M, KIM S, BYUN K, BYUN K E, KIM S W, SHIN H J, SHIN M S, JOVIN, KIM T H, JUNG J H

Processing semiconductor by generating plasma of carbon- and hydrogen-containing precursors, forming layer of graphene on substrate, and halting flow of carbon-containing precursor while maintaining plasma with hydrogen-containing precursor.

INGLE N K, MALLICK A B, SINGHA R S, WANG J, ROY S S

Preparing petal-shaped graphene field emission cold cathode, comprises selecting and cleaning substrate, selecting silicon sheet and copper foil copper foil as substrate, and growing layer of copper film on substrate surface.

ZHANG X, LEI W, ZHAO Z, ZHAO N

Graphene grid used as cryo-electron microscope grid for structural analysis of target substance e.g. protein, has structure in which functional group is introduced into surface of graphene.

TSUYOSHI I, HARUYASU A, KEI O, KEIICHI N, TAKAYUKI K, FUMIAKI M, JUNSO F, SHOTA K, KUMANO S, FUJITA J, MAKINO F, KATO T, NAMBA K, OHKUBO K, ASAHARA H, INOUE G

Preparing diamond-multilayer graphene composite cathode material e.g. used in emission display, involves grinding silicon substrate in diamond powder uniformly and compactly, putting grinded silicon substrate into suspension liquid made of diamond powder.

LIU H, GUAN L, WANG B, ZHANG W, XIONG Y

Underwater ultraviolet sterilizing device, has heat conducting shell whose bottom is provided with opening, where upper end surface of transparent quartz glass sheet and inner side surface of shell are surrounded to form sealing cavity.

YIN Y, ZHANG Z, MAO M