国家/地区 世界知识产权组织（16）
IPC部 C（11） G（7） B（4）
H（3）
IPC大类 C01（10） B82（3） C23（3）
G01（3） G03（3） H01（3）
C04（2） C08（2）
IPC小类 C01B（10） G01N（3） G03F（3）
B82Y（2） C04B（2） C08J（2）
C08K（2） C08L（2） C23C（2）
H01B（2）
IPC C01B032/194（4） C01B031/02（3） G01N027/414（3）
G03F001/22（3） G03F001/62（3） B82Y040/00（2）
C01B031/04（2） C01B032/184（2） C01B032/186（2）
C04B035/52（2） C04B035/622（2） C08J005/18（2）
C08K003/04（2） C08K009/04（2） C08L079/08（2）
发明人 KIM K S（16）
公开年 2022（7） 2021（3） 2019（2）
申请年 2019（4）  2021（4）  2020（2）  2022（2） 
专利权人 FINE SEMITEC.（3） MCK TECH CO .（3） CENT ADVANCE.（2） FST CO LTD（2）
GRAPHENE SQU.（2） KOREA INST M.（2） KUMOH NAT IN.（2）

Infrared adaptive transparent camouflage film comprises substrate portion, graphene layer on substrate portion, electrode layer spaced apart from graphene layer, and ion gel layer formed on or between graphene layer and electrode layer.

LIM M K, KIM H D, KIM K S, KIM J H, JUNG H J, LEE H J, HYUN S M, LIM M, KIM K, KIM J

Pellicle film used for extreme UV lithography, comprises boron nitride nanostructure layer.

CHOI J H, CHO S J, YU L, KIM C, LEE S Y, SEO K W, KIM K S, MOON S Y, KIMCHUNG, SEO K

Etchant composition to manufacture graphene with low sheet resistance, comprises sulfuric acid, hydrogen peroxide, purified water, N-heterocyclic aromatic compound e.g. benzotriazole, and aromatic boric acid e.g. phenyl boric acid.

MOON J, KWON Y, WOOK Y B, LEE S M, MOON S I, KIM K S, LEE G H, HYUN D, SIMSUJIN, SHIM S J, HYUN D S, YOO B W, KWON Y D, MOON J T

Method for manufacturing ion detection sensor, involves applying ion-sensitive mixed layer preparation solution so as to cover portion of upper portion of source electrode and drain electrode to provide ion-sensitive mixed layer that responds to target ions.

CHO S M, CHO M G, KIM K S, OH H G, CHO M, OHHONGGI

Reference electrode for ion measurement sensor, has graphene containing fluorine functional group treated with fluorine-benzene, and graphene is non-oxidized graphene or reduced graphene oxide.

CHO S M, CHO M G, KIM K S, OH H G, SONG K S, JO D A, CHO H S, CHO M, OHHONGGI, DAAE J, HAESHIN J

Producing pellicle for extreme ultraviolet lithography involves forming silicon carbide layer on one side of substrate, forming metal catalyst layer over the silicon carbide layer followed by removing metal catalyst layer.

YU L, CHO S J, KIM K S, SEO K W, MOON S Y, KIM J K, YOU J D, SEO K

Pellicle film used in extreme UV lithography, comprises carbyne layer containing structure in which carbyne molecules are entangled by applying coating solution prepared by mixing carbyne molecules and solvent and drying.

CHOI J H, CHO S J, YU L, KIMCHUNG, SEO K, KIM K S, LEE S Y, MOON S Y, KIM C, SEO K W

Two-dimensional structure sensor for an ion sensitive field-effect transistor, includes transistor that is formed with a substrate, which is formed with a source region and a drain region, where reference electrode is formed with graphene.

SONG K S, CHO S M, KIM K S

Heat dissipation module for LED lighting devices used in automobiles, comprises heat source and heat dissipation layer is provided for dissipating heat from heat source with photo-sintered metal-nanocarbon composite and heat sink.

KIM K S, CHOI D Y, HAN J W

Graphite sheet useful for electronic device, has thermal conductivity in plane direction, and thermal conductivity in thickness direction.

KIM K S, WON D Y, CHOI J Y, CUI Z, YUAN D, JIN J