国家/地区 中国（10）
IPC部 C（9） B（2）
IPC大类 C22（8）
IPC小类 C22C（8） C22F（4）
IPC C22C009/00（8） C22C001/10（7） C22F001/08（4）
发明人 LIU S（10）
公开年 2018（8） 2017（2）
申请年 2017（10）
专利权人 LIU S（10）

Preparing copper-based alloy blank involves taking pure copper ingot, pure silver ingot, pure silver powder and graphene powder as raw material, and removing its surface oxide by reduction treatment, and mixing pure copper and silver ingot.

LIU S

Preparing graphene-containing copper-based alloy blank comprises e.g. using pure copper ingot, pure silver ingot, pure copper powder and graphene powder, mixing pure copper ingot and pure silver ingot, heating and cooling.

LIU S

Preparation of copper-base alloy material involves mixing pure ingot and pure niobium ingot, heating mixed material and then melting, mixing pure niobium powder and graphene powder and stirring, solidifying and cooling obtained product.

LIU S

Copper-based alloy blank material comprises preset amount of copper, graphene and niobium.

LIU S

Preparation of high-yield strength copper-based alloy blank by mixing pure copper ingot and pure silver ingot, heating under argon gas protection, adding pure silver powder and graphene powder, mechanically stirring and melt casting.

LIU S

Graphene-containing copper-based alloy blank comprises copper element, graphene, and silver element.

LIU S

Copper-based alloy billet with good conductivity comprises copper, graphene state and niobium.

LIU S

Preparing high-strength copper-based alloy material involves using pure copper ingot, pure antimony ingot, pure tantalum powder, and graphene powder as raw materials, mixing pure copper ingot and pure antimony ingot, and heating.

LIU S

Graphene/silica gel solid phase extraction materials useful for carrying out enrichment and separation of benzene ring-containing carbamate pesticide residue, comprises e.g. preparing graphene colloid solution by adding graphene oxide.

LIU S, WANG L, XU J, LIU Y, SUN J, ZHANG Y

Electromagnetic wave shielding film comprises functional graphene, pigment and coating agent.

LIU S, KE L, LIANG S, SITU R