国家/地区 中国（6）
IPC部 C（6）
IPC大类 C01（3） C25（2）
IPC小类 C01B（3） C25D（2）
IPC C25D015/00（2）
发明人 WEI K（7）
公开年 2019（4） 2020（2）
申请年 2019（7）
专利权人 HUAIYIN NORM.（2） UNIV CHANGZH.（2）

Mass production equipment for preparing graphene materials, has controller that controls action of lifting platform by detecting change in current value of anode and cathode so that surface of cathode is stripped in line with electrolysis contact.

WEI K, YEN P

Preparing nitrogen and sulfur-doped graphene-copper(II) sulfide composite material comprises e.g. adding graphite powder and sodium nitrate into concentrated sulfuric acid, adding hydrogen peroxide and carrying out hydrothermal reaction.

SHENG Z, WEI K, YIN J, ZHONG H, ZHANG L

Preparing nitrogen-doped graphene by adding graphite powder, sodium nitrate, concentrated sulfuric acid and potassium permanganate, heating, adding hydrogen peroxide, washing precipitate, dialyzing, adding urea, freeze-drying and heating.

SHENG Z, WEI K, YIN J, ZHONG H, ZHANG L

Light-wave micro vacuum transistor, has metal electrode electrically connected between graphene material plate, where lower part of graphene material plate is etched with silicon dioxide material layer and connected with tungsten electrode wire.

WEI K, HUANG C, SU J

Preparation of high heat conducting copper base graphene composite material involves preparing electro-deposition solution of copper-graphite composite material, washing, removing oil and rust, and activating liquid component.

WEI W, JIA F, CHU F, WEI K, DU Q, HU J

Preparing graphene/nano twin crystal composite having tissue controllable comprises e.g. arranging a composite deposition liquid of metal-based graphene, and subjecting composite deposition liquid to direct current electrodeposition.

WEI W, JIA F, WEI K, CHU F, DU Q, HU J

Preparing graphene dispersion liquid involves mixing water and ethanol to obtain mixed solvent, adding graphene and polyacrylic acid to mixed solvent, and using mixed liquid having solid content, heating mixture.

CUI D, WANG H, WEI S, GUO X, QIAO J, WEI K, LI K, CUI J